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Semiconductor devices. Micro-electromechanical devices - Bend testing methods of thin film materials

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Semiconductor devices. Micro-electromechanical devices - Bend testing methods of thin film materials1 Scope This part of IEC 62047 specifies the method for bend testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 m and 10 m. Thin films are used as main structural materials for Micro electromechanical Systems (abbreviated as MEMS in this document) and micromachines. The main structural materials for MEMS, micromachines, etc., have special features, such as a few micron meter size, material

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Part 1 gives the bases for the diametral tolerances of Grade A and Grade B screw thread measuring cylinders and the relative merits of the two grades

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The material should be chosen in accordance with the conditions for its use

Note: It is not the aim of this guide to explain a theory

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