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Mechanical exfoliation MoSe2 on SiO2/Si

$300.00
Sale price  $300.00 Regular price 
Description

Mechanical exfoliation MoSe2 on SiO2/SiProduct Name Name: Mechanical exfoliation MoSe2 on SiO2 Si Product Overview Mechanical stripping of silicon oxide silicon substrate single layer molybdenum disulfide is a kind of single layer film material prepared from molybdenum disulfide block by mechanical stripping. The mechanical stripping method, also known as the "tape stripping method", was first proposed by Novoselov et al in 2004 when preparing single layer graphene. This method uses the

selective oxidation of alcohols and alkanes

enabling rapid charging and discharging at high current densities without significant performance degradation

Name:CMK-8

and then add the carbon nanodispersant to ultrasonic or grinding

Main ingredient:SnO2

Particle size:1-10 μm(SEM)

It is recommended that the whole process be operated under the protection of inert gas or in vacuum

Oxide layer :300nm

The method of use is to mix the carbon nanotubes first

single-walled carbon nanohorns do not have obvious long axes and have a more compact overall structure

Name:a>FePS3 Single crystal

This mechanical property makes them potentially useful in the fields of composite reinforcement

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Ships within 48 hours · Estimated delivery Oct 23 - Oct 28

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